Low Frequency RF Power Supplies
Our Low Frequency RF Power Supplies are designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.
The CLB series incorporates all of the features and innovations developed in the previous CLF series with the added advantage of lighter weight and smaller size.
The CLX series low frequency RF power supplies are available in power ranges from 600 to 12,000 Watts with fixed frequencies from 20 kHz to 2 MHz. A frequency agile option allows fast frequency timing to some loads. The conservatively rated solid-state design provides low cost of ownership with high reliability.